Dry Laser Cleaning

Nano 2800 Photonics Assembly Laser cleaning

The Femtum Nano 2800 is a complete mid-infrared semiconductor laser cleaning solution, developed for high-precision, contact-free removal of organic residues from sensitive surfaces. Specifically engineered for semiconductor and photonic components, the system is optimized to clean materials such as silicon (Si), silicon carbide (SiC), indium phosphide (InP), and fused silica without causing substrate damage. At the core of the system is Femtum’s pulsed mid-infrared fiber laser operating at 2.8 µm, a wavelength chosen for its strong absorption by many organic materials, including grease, dust, and polymer films. This enables selective energy deposition into the contaminant layer while minimizing interaction with the underlying material. The result is highly efficient ablation with excellent surface preservation, making it ideal for post-processing, pre-bond cleaning, and surface preparation in semiconductor fabrication. The Nano 2800 solution includes a single-mode pulsed laser source with a high repetition rate and pulse energy, delivering a beam with M² < 1.3. A fast opto-mechanical shutter module ensures precise timing and exposure control, which is critical in automated environments. The scanning head integrates a 2-axis galvo scanner, mid-infrared optics with adjustable focus, and a fiber collimator. This configuration allows for flexible spot size selection, a wide cleaning field, and fine spatial control over the cleaning path. This mid-infrared semiconductor laser cleaning system is entirely dry and non-abrasive, eliminating the need for chemical solvents, wet processes, or mechanical scrubbing. Its cleanroom-compatible design supports inline integration into high-throughput semiconductor production tools and photonic device assembly lines. With low pulse-to-pulse noise and repeatable energy delivery, the Nano 2800 ensures consistent process performance, making it a reliable solution for demanding microelectronics and photonics applications.